ASML, the Dutch semiconductor equipment maker, has achieved a significant milestone by reaching 'first light' on its new High NA EUV lithography system. This achievement indicates that the tool is operational and marks a crucial step towards the production of smaller, faster semiconductor chips. Intel, a leading technology company, is set to utilize this advanced technology for its 14A generation of chips, showcasing the potential impact on the semiconductor industry. The High NA EUV tool's light source and mirrors are confirmed to be functional, underscoring the technical success of this collaboration between ASML and Intel. Notably, ASML's stock was slightly down by 0.1% in pre-market trading following the announcement.
Intel and ASML achieve 'First Light' milestone with world's most advanced chipmaking tool — High-NA tools' EUV light source and mirrors are functional https://t.co/dE8ov9RKlv https://t.co/U8A7dcKAYX
$ASML $INTC ASML (ASML) has reached a key milestone towards enabling smaller, faster chips, with Intel (INTC) set to use this technology for its 14A generation of chips
ASML reaches 'first light' milestone on first High NA EUV tool https://t.co/i3OQRGN4RB https://t.co/xyhXDb93Ch
$ASML (-0.1% pre) ASML reaches 'first light' milestone on first High NA EUV tool - Reuters https://t.co/IO0suTjFPh
⚠️ ASML REACHES 'FIRST LIGHT' MILESTONE ON FIRST HIGH NA EUV TOOL (Reuters) ASML has reached "first light" on its massive new High NA EUV lithography system, the Dutch semiconductor equipment maker confirmed on Wednesday, a milestone that means the tool is functioning though… https://t.co/qXbUJ2XPWo